学术讲座预告----能量过滤透射电镜介绍及其应用

 蔡司 LIBRA 200 FETEM 介绍及其应用

日期：2009年9月16日(周三)

 地点：中山大学 测试大楼四楼课室

 演讲人：Alexander Orchowski博士（资深科学家/应用开发专家）

议程安排

09:00 – 09:45:主要特点概述

镜筒和光路

场发射电子枪和单色器

柯勒照明系统

物镜

修正的欧米噶过滤器

电子学和软件

控制和用户界面

09:45 – 10:15:讨论时间

10:15 – 11:00:应用实例

成像和衬度

电子衍射

电子能量损失谱

电子光谱成像

能量色散X射线谱

蔡司透射电镜在欧美的应用实例

利用蔡司透射电镜所获得的科研成果和发表的论文

相比其它透射电镜，蔡司透射电镜所能解决的问题

11:00 – 11:45:讨论时间

12:00 – 14:00:午餐

讲座人简历:

Scientific Curriculum Vitae

Dr. Alexander Orchowski
Berlin, Germany

University Education:

'92 Diploma in Physics at University of Tübingen, Germany
Thesis: "Preparation of a Mono-atomic Field emission Tip as Point Source for Electrons and Ions"

'96 PhD in Physics at University of Tübingen, Germany
Thesis: " High Resolution Electron Holography for Characterization of Crystalline Real Structures"
Advisor: Prof. Dr. Hannes Lichte

Selected Publication:
"Electron Holography Surmounts Resolution Limit of Electron Microscopy",
A. Orchowski, W.D. Rau and H. Lichte,
Phys. Rev. Letters, Vol. 74, 3, (1995), p. 399

Professional Career:

'97 Post-Doctoral Researcher at EXXON R&D Facility in Annandale, New Jersey, USA
Topics: TEM on Catalysts

'98 - '99 Post-Doctoral Researcher at Institute for Semiconductor Physics, Frankfurt/Oder, Germany
Topics: TEM on Semiconductor Structures, Quantitative High Resolution TEM,
Dopant Profiling by Electron Holography

'00 - '01 Project Manager at Carl Zeiss Lithos GmbH, Oberkochen, in a project for Electron Lithography

'01 - '04 Poject Manager for Development of Corrected TEMs at LEO Elektronenmikroskopie, Oberkochen

since '04 Senior Scientist / Application Development TEM at Carl Zeiss NTS GmbH, Oberkochen